Recent Faculty Awards: Willson

 

Grant Willson has been named the 2005 recipient of the Frits Zernike Award for Microlithography from the International Society for Optical Engineering (SPIE): The award is for outstanding accomplishments in microlithography technology, especially those furthering the development of semiconductor lithographic imaging solutions. Willson was recognized for being the original developer of the chemically amplified resist concept, for his pioneering work in DUV resists and his current work on 157 nm resists. The award will be presented on Feb 28.