Department of Chemical Engineering at the University of Texas at Austin go to home page university of texas at austin college of engineering U T direct
Grant Willson, PhD
Rashid Engineering Regents Chair


Office: WEL 5.240 Mailing Address:
Phone: (512) 471-4342 The University of Texas at Austin
Fax: -- Department of Chemical Engineering
Email: willson@che.utexas.edu 1 University Station C0400
UT Mail: C0400 Austin, TX 78712-0231

Research Group Web Site

Presentation Made to Prospective Graduate Students 2008

Educational Qualifications:
BS, University of California - Berkeley (1962)
MS, San Diego State University (1969)
PhD, University of California - Berkeley (1973)
IBM Fellow (1985)
A.D. Doolittle Award, PMSE Division of ACS (1986)
Alexander von Humboldt Senior Scientist Award, FRG (1988)
ACS Award in the Chemistry of Materials (1991)
ACS Carothers Awards (1992)
Elected to National Academy of Engineering (1992)
Alumnus of the Year, San Diego State University (1993)
ACS Cooperative Research Award in Polymer Science (1993)
SRC Technical Excellence Award (1996)
SRC Aristotle Award (1998)
Malcolm E. Pruitt Award (1999)
National Academy of Sciences Award for Chemistry in Service to Society (1999)
Fellow of the PMSE Division of ACS (2000)
ACS Award in Applied Polymer Science (2005)
Fritz Zernike Award, SPIE 2005 (2005)
ACS Heroes in Chemistry Award (2005)
AIChE Arthur DeHon Award (2005)

Focus:
 Polymers, materials, and processes for microelectronics, photoresists, liquid crystals, computer simulation, mass transport studies, kinetics, graft polymerization, biosensor arrays, novel processes for producing nanometer scale structures

 


 

Research [Visit Group Web Site]:
Our research projects are chosen to provide students with an interesting, challenging, and important interdisciplinary problem that will produce new and useful knowledge. The projects are also designed to provide a framework in which graduate students learn to design and carry out experiments and to report the results of their work in written and oral form. We strive to provide students with the opportunity to participate in collaborations with other students and other institutions and to thereby gain research team work experience.

You are encouraged to visit our group web page. This page is the best source of detailed information about the research group and current projects.

  • Several of our current projects are related to photoresist materials and imaging processes. The goal of this work is to develop improved materials and processes for use in the manufacturing of microelectronic devices. Work in this area is highly interdisciplinary and includes among other things, theoretical studies on polymer dissolution mechanisms, sorption and reaction kinetics in thin films. Mesoscale, Mont Carlo simulation of the step and Flash Imprint Lithography process and the conventional lithographic patterning process. This effort includes coll horations with many other faculty both within UT and outside of UT. Experiments in this area involve developing techniques ranging from high speed, variable angle spectroscopic ellipsometry and Fourier transform infrared spectroscopy to radioisotope labeling studies and high resolution electron microscopy. We have collaboration with SEMATECH that provides some of our students with access to the most advanced semiconductor wafer processing tools in the world.
  • We have a significant effort directed toward Step and Flash Imprint Lithography, a new patterning technique that can be used to produce nanostructures.
 

Selected Publications

  • Grayson, S. M.; Willson, C. G. “Self-orienting and self-assembling mesoscale amphiphilic hydrogels.” Polym. Mat. Sci. Eng. 89, 219-220 (2003).
  • Johnson, S.; Resnick, D. J.; Mancini, D.; Nordquist, K.; Dauksher, W. J.; Gehoski, K.; Baker, J.H.; Baker, L.; Dues, A.; Hooper, A.; Bailey, T.C.; Sreenivasan, S.V.; Ekerdt, J.G.; Willson, C. G. “Fabrication of Multi-tiered structures on step and flash imprint lithography templates.” Microelectronic Engineering, 67-68, 221-228 (2003).
  • Schmid, Gerard M.; Stewart, Michael D.; Burns, Sean D.; Willson, C. Grant. “Mesoscale Monte Carlo Simulation of Photoresist Processing.” J. Electrochemical Soc. 151 (2), (2004).
  • Yamada, Shintaro; Mrozek, Thomas; Rager, Timo; Owens, Jordan; Rangel, Jose; Willson, C. Grant; Byers, Jeffery. “Toward Environmentally Friendly Photolithographic Materials: A New Class of Water-Soluble Photoresists.” Macromolecules 37(2), 377-384, (2004).
  • Colburn, Matthew; Choi, Byung Jin; Sreenivasan, S.V.; Bonnecaze, Roger T.; Willson, C. Grant. “Ramifications of Lubrication Theory on Imprint Lithography,” Microelectronic Engineering 75(3), 321-329 (2004).
  • Meiring, J. E.; Schmid, M. J.; Grayson, S. M.; Rathsack, B. M.; Johnson, D. M.; Kirby, R.; Kannappan, R.; Manthiram, K.; Hsia, B.; Hogan, Z. L.; Ellington, A. D.; Pishko, M. V. and Willson, C. G. “Hydrogel Biosensor Array Platform Indexed by Shape,” Chem. Mater. 16, 5574-5580 (2004).
  • Resnick, Douglas J.; Sreenivasan, S.V.; Willson, C. Grant. “Step and Flash Imprint Lithography” Materials Today, February 2005, p. 34-42.
  • Gates, B. D.; Xu, Q.; Stewart, M.; Deschner, R.; Willson, C. G.; Whitesides, G. M. “New Approaches to Nanofabrication: Molding, Printing, and Other Techniques,” Chem. Rev. 105, 1171-1196 (2005).

  • Costner, E.; Taylor, J. C.; Caporale, S.; Wojtczak, W.; Dewulf, D.; Conley, W.; Willson, C. G.  “New High Index Fluids for Immersion Lithography,” Proc. SPIE 6153, 6153OB-1-10 (2006).

  • Lin, M. W.; Chao, H.-L.; Kim, E. K.; Palmieri, F.; Kim, W. C.; Dickey, M.; Ho, P. S.; Willson, C. G.  “Planarization for reverse-tone step and flash imprint lithography,” Proc. SPIE, 6151, pp. 61512G, (2006).

  •   Schmid, G. M.; Stewart, M. D.; Wetzel, J.; Palmieri, F.; Hao, J.; Nishimura, Y.; Jen, K.; Kim, E. K.; Resnick, D. J.; Liddle, A.; Willson, C.G.  “Implementation of an imprint damascene process for interconnect fabrication.”  JVST, 24(3), 1283-1291 (2006).

  • Schmid, M. J.; Manthiram, K.; Grayson, S. M.; Willson, J. C.; Meiring, J. E.; Bell, K. M.; Ellington, A. D. and Willson, C. G.  “Feature Multiplexing—Improving the Efficiency of Microarray Devices,” Angew. Chem. 45(20), 3338-3341 (2006).

  • Hao, J.; Palmieri, F.; Stewart, M. D.; Nishimura, Y.; Chao, H.-L.; Collins, A.; Willson, C. G. "Octa(hydridotetramethyldisiloxanyl) silsesquioxane as a synthetic template for patternable dielectric materials," Polymer Preprints (ACS, Division of Polymer Chemistry)  47(2),  1158-1159 (2006).

  • Grayson, S. M.; Long, B. K.; Kusomoto, S.; Osborn, B. P.; Callahan, R. P.; Chambers, C. R.; Willson, C. G.  “Synthesis and Characterization of Norbornanediol Isomers and Their Fluorinated Analogues,” JOC, 71(1), 341-344 (2006).

  • Dickey, M. D.; Collister, E.; Raines, A.; Tsiartas, P.; Holcombe, T.; Sreenivasan, S. V.; Bonnecaze, R. T.; Willson, C. G.  “Photocurable Pillar Arrays Formed via Electrohydrodynamic Instabilities,” Chem. Mat. 18(8), 2043-2049 (2006).

  • Willson, C. G.  “Materials for step and flash lithography,” ACS PMSE Preprints, 94, p.731 (2006).

  • Willson, C. G.  “Organic Imaging Materials:  A View of the Future,” Polymer Preprints, 47(1), p. 530 (2006).

  • Hao, J.; Lin, M. W.; Palmieri, F.; Nishimura, Y.; Chao, H.-L.;Stewart, M. D.; Collins, A.; Jen, K.; Willson, C. G.  “Photocurable silicon-based materials for imprinting lithography”  SPIE 6517 p. 6517-80 (2007).

  • Jen, W.-L.; Palmieri, F.; Chao, B.; Lin, M.; Hao, J.; Owens, J.; Sotoodeh, K.; Cheung, R.; Willson, C. G.  “Multilevel step and flash imprint lithography for direct patterning of dielectrics,” SPIE 6517, p. 6517-19 (2007).

 

 

< Go back