Hyung Joo Lee, a chemical engineering Ph.D. student, will receive the best paper award at the Advanced Equipment Control/Advanced Process Control (AEC/APC) Symposium for his research in eliminating systematic disturbances and improving chamber-to-chamber matching in semiconductors. Lee, who is supervised by chemical engineering Professor Thomas Edgar, received first place for his paper titled “Wafer-To-Wafer Feedback Control For High Volume Polysilicon Gate Etch Process Using Integrated Scatterometry.” This work was sponsored by Tokyo Electron (TEL). Merritt Funk, who work for TEL in Austin, said this control technology will help make smaller devices with better quality and performance.
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